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IPA Cleaning and Vapour Drying Whitepaper

IPA Cleaning and Vapour drying technology provides guaranteed, highly effective, streak-free cleaning and drying of a wide range of components.

The IPA cleaning process benefits from the utilisation of a proven and highly effective cleaning solvent. IPA is used extensively in applications where high yield levels are essential. IPA cleanliness levels are maintained in the process using distillation and filtration to ensure repeatable and consistent cleaning results.

The vapour drying process benefits from a proven method of IPA handling. It uses only fresh IPA for each drying batch. The method reduces contamination, improves purity and ensures repeatable and consistent drying resulting in yield improvements.

Drying Process outline

The method uses a water solubilization mechanism for complete removal of water measured down to molecular level.

 

The technology uses IPA to absorb surface water. With an extremely low surface tension rating, the IPA permeates surface cracks, line geometries and deep trenches.

As a result the vapour dryer effectively removes moisture which other drying systems may not reach.

The IPA then rises to the surface and uniformly covers the product surface. No impurities are introduced by this process, thereby protecting the integrity of the component surface

In the drying process the water-enriched IPA sheds off the surface of the substrate, due to the specific gravity differential of IPA and DI water. Final rinsing is then performed through continued vapour condensation.

IPA Vapor Dryer.


Process outline

The method uses a water solubilization mechanism for complete removal of water measured down to molecular level.

The technology uses IPA to absorb surface water. With an extremely low surface tension rating, the IPA permeates surface cracks, line geometries and deep trenches.

As a result the vapour dryer effectively removes moisture which other drying systems may not reach.

The IPA then rises to the surface and uniformly covers the product surface. No impurities are introduced by this process, thereby protecting the integrity of the component surface.

In the drying process the water-enriched IPA sheds off the surface of the substrate, due to the specific gravity differential of IPA and DI water. Final rinsing is then performed through continued vapour condensation.